III-nitride blue and ultraviolet photonic crystal light emitting diodes
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Abstract
We present results on enhancement of 460 nm blue and 340 nm UV optical power output in III-nitride light emitting diodes (LEDs) using photonic crystals (PCs) under current injection. Triangular arrays of the PCs with diameter/periodicity of 300/700 nm were patterned using electron-beam lithography and inductively coupled plasma dry etching. The total power at 20 mA of 300×300 μm2 unpackaged LED chips revealed an increase by 63% and 95% for the blue and UV LEDs, respectively, as a result of the PC formation. Possible ways for further improving enhancement of light extraction using PCs are discussed. © 2004 American Institute of Physics.
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">III-nitride blue and ultraviolet photonic crystal light emitting diodes</title><author><name sortKey="Oder, T N" uniqKey="Oder T">T. N. Oder</name><affiliation wicri:level="2"><inist:fA14 i1="01"><s1>Department of Physics, Kansas State University, Manhattan, Kansas 66506-2601</s1><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>4 aut.</sZ></inist:fA14><country xml:lang="fr">États-Unis</country><placeName><region type="state">Kansas</region></placeName><wicri:cityArea>Department of Physics, Kansas State University, Manhattan</wicri:cityArea></affiliation></author><author><name sortKey="Kim, K H" uniqKey="Kim K">K. H. Kim</name><affiliation wicri:level="2"><inist:fA14 i1="01"><s1>Department of Physics, Kansas State University, Manhattan, Kansas 66506-2601</s1><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>4 aut.</sZ></inist:fA14><country xml:lang="fr">États-Unis</country><placeName><region type="state">Kansas</region></placeName><wicri:cityArea>Department of Physics, Kansas State University, Manhattan</wicri:cityArea></affiliation></author><author><name sortKey="Lin, J Y" uniqKey="Lin J">J. Y. Lin</name><affiliation wicri:level="2"><inist:fA14 i1="01"><s1>Department of Physics, Kansas State University, Manhattan, Kansas 66506-2601</s1><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>4 aut.</sZ></inist:fA14><country xml:lang="fr">États-Unis</country><placeName><region type="state">Kansas</region></placeName><wicri:cityArea>Department of Physics, Kansas State University, Manhattan</wicri:cityArea></affiliation></author><author><name sortKey="Jiang, H X" uniqKey="Jiang H">H. X. Jiang</name><affiliation wicri:level="2"><inist:fA14 i1="01"><s1>Department of Physics, Kansas State University, Manhattan, Kansas 66506-2601</s1><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>4 aut.</sZ></inist:fA14><country xml:lang="fr">États-Unis</country><placeName><region type="state">Kansas</region></placeName><wicri:cityArea>Department of Physics, Kansas State University, Manhattan</wicri:cityArea></affiliation></author></titleStmt><publicationStmt><idno type="inist">04-0055877</idno><date when="2004-01-26">2004-01-26</date><idno type="stanalyst">PASCAL 04-0055877 AIP</idno><idno type="RBID">Pascal:04-0055877</idno><idno type="wicri:Area/Main/Corpus">00C073</idno><idno type="wicri:Area/Main/Repository">00A849</idno></publicationStmt><seriesStmt><idno type="ISSN">0003-6951</idno><title level="j" type="abbreviated">Appl. phys. lett.</title><title level="j" type="main">Applied physics letters</title></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Aluminium compounds</term><term>Electron beam lithography</term><term>Experimental study</term><term>Gallium compounds</term><term>Indium compounds</term><term>Light emitting diodes</term><term>Nitrogen compounds</term><term>photonic crystals</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>8560J</term><term>4270Q</term><term>Etude expérimentale</term><term>Diode électroluminescente</term><term>Gallium composé</term><term>Indium composé</term><term>Aluminium composé</term><term>Azote composé</term><term>Lithographie faisceau électron</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">We present results on enhancement of 460 nm blue and 340 nm UV optical power output in III-nitride light emitting diodes (LEDs) using photonic crystals (PCs) under current injection. Triangular arrays of the PCs with diameter/periodicity of 300/700 nm were patterned using electron-beam lithography and inductively coupled plasma dry etching. The total power at 20 mA of 300×300 μm<sup>2</sup> unpackaged LED chips revealed an increase by 63% and 95% for the blue and UV LEDs, respectively, as a result of the PC formation. Possible ways for further improving enhancement of light extraction using PCs are discussed. © 2004 American Institute of Physics.</div></front></TEI><inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0003-6951</s0></fA01><fA02 i1="01"><s0>APPLAB</s0></fA02><fA03 i2="1"><s0>Appl. phys. lett.</s0></fA03><fA05><s2>84</s2></fA05><fA06><s2>4</s2></fA06><fA08 i1="01" i2="1" l="ENG"><s1>III-nitride blue and ultraviolet photonic crystal light emitting diodes</s1></fA08><fA11 i1="01" i2="1"><s1>ODER (T. N.)</s1></fA11><fA11 i1="02" i2="1"><s1>KIM (K. H.)</s1></fA11><fA11 i1="03" i2="1"><s1>LIN (J. Y.)</s1></fA11><fA11 i1="04" i2="1"><s1>JIANG (H. X.)</s1></fA11><fA14 i1="01"><s1>Department of Physics, Kansas State University, Manhattan, Kansas 66506-2601</s1><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>4 aut.</sZ></fA14><fA20><s1>466-468</s1></fA20><fA21><s1>2004-01-26</s1></fA21><fA23 i1="01"><s0>ENG</s0></fA23><fA43 i1="01"><s1>INIST</s1><s2>10020</s2></fA43><fA44><s0>8100</s0><s1>© 2004 American Institute of Physics. All rights reserved.</s1></fA44><fA47 i1="01" i2="1"><s0>04-0055877</s0></fA47><fA60><s1>P</s1></fA60><fA61><s0>A</s0></fA61><fA64 i1="01" i2="1"><s0>Applied physics letters</s0></fA64><fA66 i1="01"><s0>USA</s0></fA66><fC01 i1="01" l="ENG"><s0>We present results on enhancement of 460 nm blue and 340 nm UV optical power output in III-nitride light emitting diodes (LEDs) using photonic crystals (PCs) under current injection. Triangular arrays of the PCs with diameter/periodicity of 300/700 nm were patterned using electron-beam lithography and inductively coupled plasma dry etching. The total power at 20 mA of 300×300 μm<sup>2</sup> unpackaged LED chips revealed an increase by 63% and 95% for the blue and UV LEDs, respectively, as a result of the PC formation. 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